HfTaN3

semiconductor

· HfTaN3

HfTaN3 is a refractory ceramic compound combining hafnium, tantalum, and nitrogen, belonging to the family of transition metal nitrides and carbides. This material is primarily of research interest for extreme-environment applications where thermal stability and hardness are critical; it represents the broader class of high-entropy and multi-element nitride ceramics being investigated as alternatives to traditional refractory coatings and structural ceramics in aerospace and nuclear contexts.

high-temperature coatingsrefractory applicationsextreme-environment researchaerospace thermal protectionhard surface coatingsnuclear materials research

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.4000	eV	—
Magnetic Moment(μB)	-0.00000250	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	0.8800	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfTaN3

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control