HfSiOFN

ceramic
· HfSiOFN

HfSiOFN is an advanced ceramic compound combining hafnium, silicon, oxygen, and fluorine/nitrogen constituents, designed for extreme-environment applications requiring thermal stability and chemical resistance. This material family is primarily of research interest for next-generation gate dielectrics in microelectronics, thermal barrier coatings in aerospace engines, and high-temperature structural applications where conventional silicates degrade. Its appeal lies in the ability to achieve high dielectric constants and thermal stability simultaneously—properties difficult to combine in traditional oxides—making it a candidate for scaling semiconductor devices and protecting components in hypersonic and combustion environments.

advanced gate dielectricsthermal barrier coatingshigh-temperature oxidation protectionaerospace engine componentssemiconductor materials researchextreme-environment ceramics

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Band Gap(Eg)
—
eV——
Magnetic Moment(μB)
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μB——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Formation Energy(ΔHf)
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eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.