HfOsO2N is an experimental ceramic compound combining hafnium, osmium, oxygen, and nitrogen—a member of the refractory oxynitride family designed for extreme-temperature and high-hardness applications. This material remains primarily in research and development phases, with potential utility in aerospace thermal barriers, wear-resistant coatings, and high-temperature structural applications where conventional refractories fall short. The inclusion of osmium (a rare, dense transition metal) suggests development toward ultra-high-temperature environments or specialized wear surfaces, though industrial adoption and processing routes remain limited.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.00297 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.860 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data