Hafnium oxide (HfO₂) is a high-performance ceramic compound valued for its exceptional thermal stability, wide bandgap, and chemical inertness across demanding environments. It is widely used in microelectronics as a high-κ dielectric in advanced semiconductor gate stacks, in thermal barrier coatings for aerospace engines, and in optical coatings for UV and infrared applications. Engineers select HfO₂ over alternatives like SiO₂ when superior permittivity, higher melting point, or enhanced radiation resistance is required, making it essential for next-generation processors, hypersonic vehicle components, and extreme-environment sensing systems.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K)3 entries | 229.2 | GPa | — | ||
| ↳ | 229.2 | GPa | — | ||
| ↳ | 229.2 | GPa | — | ||
Elastic Compliance Tensor(Sij) | Matrix (redacted) | 1/GPa | — | ||
Elastic Anisotropy(AU) | 0.07048 | - | — | ||
Elastic Stiffness Tensor(Cij) | Matrix (redacted) | Pa | — | ||
Poisson's Ratio(ν)2 entries | 0.2819 | - | — | ||
| ↳ | 0.2900 | - | — | ||
Shear Modulus(G)3 entries | 117.0 | GPa | — | ||
| ↳ | 117.0 | GPa | — | ||
| ↳ | 115.9 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 17.74 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — | ||
Seebeck Coefficient(S) | 7.670 | µV/K | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.000 | eV/atom | — | ||
Formation Energy(ΔHf) | -0.7712 | eV/atom | — |