HfLaO2N
ceramic· HfLaO2N
HfLaO₂N is an oxynitride ceramic compound combining hafnium, lanthanum, oxygen, and nitrogen phases, belonging to the family of high-k dielectric and refractory materials. This is primarily a research material investigated for advanced microelectronic gate dielectrics and high-temperature structural applications, where its mixed ionic-covalent bonding and potential for tunable electronic properties offer advantages over conventional oxides in demanding thermal and electrical environments.
advanced gate dielectricshigh-k semiconductor devicesresearch and developmenthigh-temperature ceramicsnext-generation CMOS technology
Compliance & Regulations
?Conflict Free?RoHS?REACH?TSCA?Prop 65
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |
Verified Unverified Low confidence (<80%) Link to source
Regulatory Screening
Environmental
RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.