HfInOFN is a hafnium-indium oxynitride fluoride ceramic compound, representing a complex mixed-metal oxide-nitride system. This material is primarily a research-phase ceramic studied for advanced applications requiring high thermal stability, chemical resistance, and potentially enhanced electronic or ionic transport properties. The multi-element composition and inclusion of fluorine make it notable in the materials science literature for exploring new compositional spaces in high-entropy and multi-principal-element ceramics, with potential applications in harsh environments where traditional oxides or nitrides fall short.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.8118 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.780 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data