HfAuO2N

ceramic

· HfAuO2N

HfAuO2N is an experimental ceramic compound combining hafnium, gold, oxygen, and nitrogen—a quaternary nitride-oxide system that remains primarily in research phase. This material family is of interest for high-temperature applications and advanced electronic devices where the unique combination of refractory hafnium, noble-metal gold, and nitrogen doping could offer enhanced thermal stability, oxidation resistance, or modified electronic properties. Practical industrial deployment is limited; applications are mainly exploratory in academic settings focused on next-generation barrier coatings, high-k dielectric systems, or catalytic substrates.

High-temperature barrier coatingsAdvanced semiconductor researchThermal oxidation protectionCatalytic substrate developmentExperimental electronics materials

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	-0.00151	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	2.460	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfAuO2N

Electrical Properties

Other Properties

Regulatory Screening

Environmental