HfAsO2N

ceramic

· HfAsO2N

HfAsO₂N is an advanced ceramic compound combining hafnium, arsenic, oxygen, and nitrogen—a complex oxynitride material that represents emerging research in high-performance ceramic science. This material belongs to the family of transition metal oxynitrides, which are investigated for applications requiring exceptional thermal stability, oxidation resistance, and potentially enhanced mechanical or electrical properties at extreme conditions. While not yet established in mainstream industrial production, hafnium-based oxynitrides are of particular interest in aerospace and high-temperature electronics contexts where conventional ceramics reach their limits.

high-temperature structural ceramicsaerospace thermal barriersextreme environment coatingsrefractory applicationsadvanced electronics substratesresearch-phase development

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	0.6154	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.320	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfAsO2N

Electrical Properties

Other Properties

Regulatory Screening

Environmental