HfAlO2F

ceramic

· HfAlO2F

HfAlO2F is a hafnium-aluminum oxide fluoride ceramic compound combining hafnium, aluminum, oxygen, and fluorine in its structure. This material belongs to the family of advanced oxide ceramics with fluorine doping, primarily investigated in research contexts for high-temperature and dielectric applications. The incorporation of fluorine into hafnium-aluminum oxide systems is notable for potential improvements in thermal stability, dielectric properties, and resistance to oxidation compared to conventional HfO₂ or Al₂O₃ alternatives.

high-temperature dielectricsgate dielectrics (advanced semiconductor processing)thermal barrier coatings researchextreme environment ceramicsfluoride-doped oxide systems

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	1.444	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.100	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfAlO2F

Electrical Properties

Other Properties

Regulatory Screening

Environmental