HfAgO2N is an experimental oxynitride ceramic compound combining hafnium, silver, oxygen, and nitrogen phases. This material family is under active research for high-temperature structural applications and advanced electronic/photonic devices, where the combination of refractory hafnium with silver's conductivity and oxynitride chemistry offers potential for enhanced thermal stability, electrical properties, or catalytic function compared to traditional oxide or nitride ceramics alone.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.00527 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 2.360 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data