Hf3 N4

semiconductor
· Hf3 N4

Hf₃N₄ is a hafnium nitride ceramic compound belonging to the refractory nitride family, characterized by high thermal stability and hardness at elevated temperatures. This material is primarily investigated in research contexts for ultra-high-temperature applications, coatings, and advanced semiconductor device structures where its wide bandgap and thermal properties offer potential advantages over conventional materials. Compared to traditional nitrides like TiN or AlN, hafnium nitride compounds enable operation at extreme temperatures and show promise in next-generation power electronics and thermal barrier applications, though commercial deployment remains limited outside specialized aerospace and defense programs.

high-temperature coatingsrefractory ceramicswide-bandgap semiconductorsthermal barrier materialsadvanced electronics packagingaerospace thermal protection

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Band Gap(Eg)
—
eV——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Formation Energy(ΔHf)
—
eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.