Hf2TaN3 is a ceramic compound belonging to the refractory metal nitride family, combining hafnium and tantalum in a ternary nitride structure. This material is primarily of research and development interest rather than established commercial production, investigated for extreme-environment applications where its high melting point and hardness are potentially valuable. The material represents the broader class of advanced ceramic nitrides being explored for ultra-high-temperature structural applications, though it remains in the experimental phase with limited industrial deployment compared to more established nitride and carbide ceramics.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 12.81 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — | ||
Seebeck Coefficient(S) | -8.793 | µV/K | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.5034 | eV/atom | — | ||
Formation Energy(ΔHf) | -1.220 | eV/atom | — |