Hf₂Ge₂Te₈ is a layered semiconductor compound combining hafnium, germanium, and tellurium in a 2:2:8 stoichiometry. This material belongs to the family of transition metal chalcogenides and is primarily of research interest for its potential in thermoelectric and optoelectronic applications, where the layered structure and mixed-metal composition offer tunable band gaps and thermal transport properties.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.02360 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.4600 | eV/atom | — |