Hf₂Ge₂S₂ is a layered semiconductor compound combining hafnium, germanium, and sulfur, belonging to the family of transition metal chalcogenides with potential for two-dimensional material applications. This is primarily a research-stage material being investigated for optoelectronic and thermoelectric device development, where its layered crystal structure and semiconductor properties could enable integration into next-generation electronics, particularly in flexible or ultrathin device architectures where traditional bulk semiconductors are impractical.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 127.1 | GPa | — | ||
Shear Modulus(G) | 81.58 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00460 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.132 | eV/atom | — |