Hf2Cl2N2 is an experimental hafnium chloride nitride compound belonging to the broader family of transition metal nitrides and halides, which are being investigated for semiconductor and refractory applications. While not yet widely deployed in commercial products, hafnium-based compounds are of interest to researchers exploring next-generation materials for high-temperature electronics, advanced coatings, and extreme-environment devices due to hafnium's high melting point and chemical stability. This particular composition represents exploratory materials science aimed at combining the properties of hafnium nitrides with halide chemistry to achieve novel electronic or structural characteristics.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 74.37 | GPa | — | ||
Shear Modulus(G) | 33.28 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.212 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -2.019 | eV/atom | — |