Hf1 In1 Ni2

semiconductor
· Hf1 In1 Ni2

Hf₁In₁Ni₂ is an intermetallic compound combining hafnium, indium, and nickel in a fixed stoichiometric ratio, belonging to the broader class of ternary metallic intermetallics. This material is primarily of research interest for investigating phase stability, electronic structure, and mechanical properties in the Hf-In-Ni system, with potential applications in high-temperature structural materials or functional electronic devices. The incorporation of hafnium—a refractory metal with excellent high-temperature strength—combined with the electronic properties of indium and nickel, positions this compound as a candidate for exploratory work in aerospace, thermal barrier, or semiconductor-related research contexts, though industrial adoption remains limited pending further characterization.

High-temperature intermetallic researchRefractory alloy developmentSemiconductor materials explorationPhase diagram studiesThermomechanical testingAdvanced functional materials

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Bulk Modulus(K)
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Pa——
Shear Modulus(G)
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Pa——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Band Gap(Eg)
—
eV——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Formation Energy(ΔHf)
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eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.