GeSnOFN is an experimental quaternary semiconductor compound combining germanium, tin, oxygen, and fluorine elements, representing an emerging material in the broader family of group IV and mixed-halide semiconductors. This composition is primarily of research interest for next-generation optoelectronic and photonic applications, where tunable bandgap and enhanced carrier mobility are sought; it remains largely in the laboratory phase with potential advantages over conventional Si and GaAs in specific niche applications requiring fluorine doping or tin-germanium engineering.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.3000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -2.126e-16 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.8600 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data