Ge₀.₈₈Si₀.₁₂ is a germanium-silicon alloy semiconductor in the SiGe material system, engineered to combine silicon's process compatibility with germanium's superior carrier mobility. This composition sits within the range used in advanced heterojunction bipolar transistors (HBTs) and high-speed mixed-signal integrated circuits, where the controlled Ge fraction provides a tuned bandgap and enhanced hole mobility compared to pure silicon, while remaining compatible with mainstream silicon fabrication infrastructure.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.8400 | eV | — |