GaTaOFN is an experimental oxynitride semiconductor compound combining gallium, tantalum, oxygen, and nitrogen elements, belonging to the family of wide-bandgap semiconductors being explored for next-generation optoelectronic and power device applications. This material exists primarily in research contexts as scientists investigate its potential for visible-light photocatalysis, UV detection, and high-temperature electronic applications where conventional semiconductors reach performance limits. The oxynitride composition offers a tunable electronic structure between oxide and nitride counterparts, making it of interest for tailored optical and electrical properties in emerging device architectures.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.3000 | eV | — | ||
Magnetic Moment(μB) | 3.187e-16 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.4600 | eV/atom | — |