Gallium oxide (Ga₂O₃) is a wide-bandgap semiconductor ceramic with emerging applications in next-generation power electronics and RF devices. It is primarily pursued in research and early-stage industrial development rather than established high-volume production, with significant potential to outperform silicon and gallium nitride in high-voltage and high-temperature switching applications due to its superior breakdown field strength.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 5.439 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.4323 | eV/atom | — | ||
Formation Energy(ΔHf) | -1.238 | eV/atom | — |