GaLaN₃ (gallium aluminum nitride) is an experimental wide-bandgap ceramic compound combining gallium nitride and aluminum nitride phases, belonging to the III-V nitride family. Research interest in this material centers on high-temperature semiconductor and optoelectronic applications where the intermediate bandgap between GaN and AlN offers potential advantages in power electronics, RF devices, and deep-UV emitters. While not yet commercialized at scale, GaLaN₃ represents a promising intermediate composition for engineering enhanced thermal stability and carrier transport properties compared to binary nitride phases.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 2.998 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 2.220 | eV/atom | — |