GaHfO2S is an experimental mixed-metal oxide-sulfide ceramic compound combining gallium, hafnium, oxygen, and sulfur. This material belongs to the family of wide-bandgap semiconductors and advanced ceramics, currently in research and development rather than established commercial production. The compound is of interest for high-temperature applications, optoelectronic devices, and potentially radiation-hard semiconductor applications where hafnium's thermal stability and gallium's electronic properties can be leveraged together.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | -0.000244 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.7800 | eV/atom | — |