Ga₄Si₁O₈ is an experimental gallium silicate semiconductor compound combining gallium oxide with silicon in a mixed-valence oxide structure. This material belongs to the wide-bandgap semiconductor family and is primarily of research interest for next-generation optoelectronic and high-temperature electronic applications where conventional semiconductors reach their limits. While not yet commercialized at scale, gallium silicate compounds are being investigated for ultraviolet (UV) photonics, high-power switching devices, and extreme-temperature sensing due to the promising properties of gallium oxide-based systems.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.648 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -2.146 | eV/atom | — |