Ga₄Ni₂O₈ is a mixed-metal oxide semiconductor compound combining gallium and nickel in a spinel-related crystal structure. This material is primarily of research interest rather than established industrial production, studied for its potential in optoelectronic and catalytic applications due to the semiconducting properties arising from the gallium-nickel oxide system. The compound represents exploration within the broader family of ternary oxide semiconductors, where composition tuning between metallic and oxygen bonding can yield tunable bandgaps and catalytic activity.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.1443 | eV | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.662 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data