Ga₂H₁₀N₄F₄ is a gallium-nitrogen hydride compound with fluorine substitution, belonging to the family of III-V semiconductor materials and gallium nitride (GaN) derivatives. This appears to be a research-phase compound rather than a production material; compounds in this chemical space are being investigated for wide-bandgap semiconductor applications, potentially offering improved thermal stability and electrical performance compared to conventional silicon in high-power or high-frequency devices. The fluorine incorporation may be explored for tuning electronic properties or enhancing specific device characteristics in next-generation power electronics and RF applications.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.913 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.9650 | eV/atom | — |