Fe₃H₄O₂F₈ is an experimental iron-based mixed-anion compound combining hydride, oxide, and fluoride ligands in a semiconductor framework. This represents an emerging class of multianion materials under investigation for next-generation electrochemical and photovoltaic applications, where the combination of different anionic species may enable tunable band gaps and enhanced ion transport compared to conventional binary or ternary semiconductors.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.01190 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.802 | eV/atom | — |