As1N1O2F6 is an arsenic-nitrogen-oxygen-fluorine compound in the semiconductor material family, likely an experimental or specialized research composition rather than a commercial semiconductor. This compound belongs to the broader class of arsenic-based semiconductors and fluorine-containing materials, which are of interest in optoelectronics and high-frequency device research due to fluorine's influence on electronic properties and thermal stability.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.982 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.499 | eV/atom | — |