AlGaN is a III-nitride semiconductor alloy combining aluminum and gallium nitride, engineered for high-performance optoelectronic and power electronic devices. It is widely used in ultraviolet (UV) light-emitting diodes, high-electron-mobility transistors (HEMTs) for RF and power applications, and deep-UV photonics, where its wide bandgap and high thermal stability outperform traditional silicon and GaAs alternatives. The aluminum content can be tuned to control bandgap energy, making it particularly valuable for applications requiring operation at elevated temperatures or in harsh environments.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 70.79 | GPa | — | ||
Shear Modulus(G) | 32.01 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 3.483 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.8661 | eV/atom | — | ||
Formation Energy(ΔHf) | -0.2335 | eV/atom | — |