Al₁Sn₁O₃ is an experimental ternary oxide semiconductor compound combining aluminum and tin oxides in a 1:1 ratio. This material is primarily investigated in research contexts for applications requiring mixed-metal oxide semiconductors, where the combination of aluminum and tin oxides may offer tunable electronic properties, enhanced chemical stability, or improved performance in specific device architectures compared to single-component oxides like Al₂O₃ or SnO₂.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 155.1 | GPa | — | ||
Shear Modulus(G) | 62.94 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.01090 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.114 | eV/atom | — |