AgHfO2F is an experimental mixed-metal oxide fluoride semiconductor combining silver, hafnium, oxygen, and fluorine elements. This compound belongs to the family of complex metal oxide fluorides and is primarily investigated in research contexts for optoelectronic and electronic device applications. The incorporation of fluorine and the use of hafnium—a high-κ dielectric material—suggest potential for next-generation thin-film devices, though this material remains in early-stage development with limited commercial deployment.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.900 | eV | — | ||
Magnetic Moment(μB) | -4.438e-16 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.3200 | eV/atom | — |